前沿光刻胶材料设计与性能研究：（1）新型光刻胶开发：探索新材料与新技术；（2）光刻胶材料设计：从分子到性能的精准调控；（3）光刻胶性能优化：理论模拟与实验验证的结合。

集成电路制造中光刻胶材料的应用技术与工艺优化：（1）提升光刻分辨率与精度的关键材料；（2）针对先进光刻工艺的性能定制；（3）光刻胶材料在复杂工艺节点下的稳定性与兼容性研究。

Frontier research on photoresist material design and performance: (1) Novel photoresist development: exploring new materials and technologies; (2) Photoresist material design: precise control from molecule to performance; (3) Photoresist performance optimization: integration of theoretical simulation and experimental verification.

Application techniques and process optimization of photoresist materials in integrated circuit manufacturing: (1) Key materials for enhancing lithography resolution and accuracy; (2) Performance customization for advanced lithography processes; (3) Stability and compatibility studies of photoresist materials at complex process nodes

邓海            复旦大学

魏大程        复旦大学

伍广朋        浙江大学

复旦大学；浙江大学

赵艺            复旦大学

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